Samukawa, S. : rechercher sur Z-Library

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1

Dependence of polymer main-chain structure on roughness formation of ArF photoresists in the plasma etching processes

Uesugi, Takuji, Okada, Takeru, Wada, Akira, Kato, Keisuke, Yasuda, Atsushi, Maeda, Shinichi, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Année:

2012

Langue:

english

Fichier:

PDF, 839 KB

english, 2012

2

On-wafer monitoring of plasma-induced electrical current in silicon dioxide to predict plasma radiation damage

Okigawa, Mitsuru, Ishikawa, Yasushi, Samukawa, Seiji

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Année:

2005

Langue:

english

Fichier:

PDF, 944 KB

english, 2005

3

Atomic layer germanium etching for 3D Fin-FET using chlorine neutral beam

Ohori, Daisuke, Fujii, Takuya, Noda, Shuichi, Mizubayashi, Wataru, Endo, Kazuhiko, Lee, En-Tzu, Li, Yiming, Lee, Yao-Jen, Ozaki, Takuya, Samukawa, Seiji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Année:

2019

Langue:

english

Fichier:

PDF, 1.12 MB

english, 2019

4

Decisive factors affecting plasma resistance and roughness formation in ArF photoresist

Jinnai, Butsurin, Uesugi, Takuji, Koyama, Koji, Kato, Keisuke, Yasuda, Atsushi, Maeda, Shinichi, Momose, Hikaru, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Année:

2010

Langue:

english

Fichier:

PDF, 621 KB

english, 2010

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advanced Etch Technology for Nanopatterning IV - Low-temperature and damage-free transition metal and magnetic material etching using a new metallic complex reaction

Lin, Qinghuang, Engelmann, Sebastian U., Zhang, Ying, Nozawa, Toshihisa, Miyama, Ryo, Kubota, Shinji, Moyama, Kazuki, Kubota, Tomihiro, Samukawa, Seiji

Année:

2015

Langue:

english

Fichier:

PDF, 492 KB

english, 2015

6

The effects of polymer side-chain structure on roughness formation of ArF photoresist in plasma etching processes

Uesugi, Takuji, Okada, Takeru, Wada, Akira, Kato, Keisuke, Yasuda, Atsushi, Maeda, Shinichi, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Année:

2012

Langue:

english

Fichier:

PDF, 661 KB

english, 2012

7

[IEEE 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2016.6.12-2016.6.13)] 2016 IEEE Silicon Nanoelectronics Workshop (SNW) - Neutral beam technology -defect-free nanofabrication for novel nano-materials and nano-devices

Samukawa, Seiji

Année:

2016

Langue:

english

Fichier:

PDF, 205 KB

english, 2016

8

Facilitating action of asiaticoside at low doses on burn wound repair and its mechanism

Yoshiyuki Kimura, Maho Sumiyoshi, Kei-ichi Samukawa, Noriko Satake, Masahiro Sakanaka

Journal:

European Journal of Pharmacology

Année:

2008

Langue:

english

Fichier:

PDF, 1.21 MB

english, 2008

9

[IEEE 2009 IEEE 22nd International Conference on Micro Electro Mechanical Systems (MEMS) - Sorrento, Italy (2009.01.25-2009.01.29)] 2009 IEEE 22nd International Conference on Micro Electro Mechanical Systems - Damage-Free Plasma Etching Processes for Future Nanoscale Devices

Année:

2009

Langue:

english

Fichier:

PDF, 12.13 MB

english, 2009

10

Renovation of Concrete Water Tank in Chiba Prefecture, Japan

Takeuchi, Hikaru, Taketomi, Sachiro, Samukawa, Shinya, Nanni, Antonio

Journal:

Practice Periodical on Structural Design and Construction

Année:

2004

Langue:

english

Fichier:

PDF, 1.37 MB

english, 2004

11

Effect of neutral beam etching on mechanical property of microcantilevers

Nishimori, Yuki, Ueki, Shinji, Miwa, Kazuhiro, Kubota, Tomohiro, Sugiyama, Masakazu, Samukawa, Seiji, Hashiguchi, Gen

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Année:

2013

Langue:

english

Fichier:

PDF, 1.52 MB

english, 2013

12

Hard-Mask-Through UV-Light-Induced Damage to Low- k Film during Plasma Process for Dual Damascene

Matsunaga, Noriaki, Okumura, Hirokatsu, Jinnai, Butsurin, Samukawa, Seiji

Journal:

Japanese Journal of Applied Physics

Année:

2010

Langue:

english

Fichier:

PDF, 881 KB

english, 2010

13

Effect of General Warm-Up Plus Dynamic Stretching on Endurance Running Performance in Well-Trained Male Runners

Yamaguchi, Taichi, Takizawa, Kazuki, Shibata, Keisuke, Tomabechi, Nobuyasu, Samukawa, Mina, Yamanaka, Masanori

Journal:

Research Quarterly for Exercise and Sport

Année:

2019

Langue:

english

Fichier:

PDF, 985 KB

english, 2019

14

Coherent and incoherent impacts of nanopillars on the thermal conductivity in silicon nanomembranes

Huang, Xin, Ohori, Daisuke, Yanagisawa, Ryoto, Anufriev, Roman, Samukawa, Seiji, Nomura, Masahiro

Journal:

ACS Applied Materials & Interfaces

Année:

2020

Fichier:

PDF, 23.05 MB

2020

15

[IEEE 2020 IEEE 20th International Conference on Nanotechnology (IEEE-NANO) - Montreal, QC, Canada (2020.7.29-2020.7.31)] 2020 IEEE 20th International Conference on Nanotechnology (IEEE-NANO) - New Proficient Ferroelectric Nanosheet Line Tunneling FETs with Strained SiGe through Scaled n-epitaxial Layer

Thoti, Narasimhulu, Li, Yiming, Kola, Sekhar Reddy, Samukawa, Seiji

Année:

2020

Fichier:

PDF, 1.11 MB

2020

16

Expression of heme oxygenase-1 in human leukemic cells and its regulation by transcriptional repressor Bach1

Takuya Miyazaki, Yohei Kirino, Mitsuhiro Takeno, Sei Samukawa, Maasa Hama, Masatsugu Tanaka, Satoshi Yamaji, Atsuhisa Ueda, Naoto Tomita, Hiroyuki Fujita, Yoshiaki Ishigatsubo

Journal:

Année:

2010

Langue:

english

Fichier:

PDF, 606 KB

english, 2010

17

Fabrication of FinFETs by Damage-Free Neutral-Beam Etching Technology

Endo, K., Shuichi Noda, Masahara, M., Kubota, T., Ozaki, T., Samukawa, S., Yongxun Liu, Ishii, K., Ishikawa, Y., Sugimata, E., Matsukawa, T., Takashima, H., Yamauchi, H., Suzuki, E.

Journal:

IEEE Transactions on Electron Devices

Année:

2006

Langue:

english

Fichier:

PDF, 706 KB

english, 2006

18

Effects of formation of mini-bands in two-dimensional array of silicon nanodisks with SiC interlayer for quantum dot solar cells

Igarashi, Makoto, Budiman, Mohd Fairuz, Pan, Wugen, Hu, Weiguo, Tamura, Yosuke, Syazwan, Mohd Erman, Usami, Noritaka, Samukawa, Seiji

Journal:

Année:

2013

Langue:

english

Fichier:

PDF, 1.03 MB

english, 2013

19

Ultra-low-damage radical treatment for the highly controllable oxidation of large-scale graphene sheets

Huang, Chi-Hsien, Su, Ching-Yuan, Lai, Chao-Sung, Li, Yen-Cheng, Samukawa, Seiji

Journal:

Année:

2014

Langue:

english

Fichier:

PDF, 1.42 MB

english, 2014

20

High-Efficiency Neutral-Beam Generation by Combination of Inductively Coupled Plasma and Parallel Plate DC Bias

Samukawa, Seiji, Sakamoto, Keisuke, Ichiki, Katsunori

Journal:

Japanese Journal of Applied Physics

Année:

2001

Langue:

english

Fichier:

PDF, 60 KB

english, 2001

21

[IEEE 2007 IEEE International Conference on Integrated Circuit Design and Technology - Austin, TX, USA (2007.05.30-2007.06.1)] 2007 IEEE International Conference on Integrated Circuit Design and Technology - Plasma-Induced Damage and Its Control in Plasma Etching Processes

Samukawa, Seiji

Année:

2007

Langue:

english

Fichier:

PDF, 809 KB

english, 2007

22

[IEEE 2014 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) - Waikiki Beach, HI, USA (2014.4.13-2014.4.16)] The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) - Fabrication and evaluation of silicon micromechanical resonator using neutral beam etching technology

Van Toan, Nguyen, Kubota, Tomohiro, Seknar, Halubai, Samukawa, Seiji, Ono, Takahito

Année:

2014

Langue:

english

Fichier:

PDF, 3.32 MB

english, 2014

23

200-mm-diameter neutral beam source based on inductively coupled plasma etcher and silicon etching

Kubota, Tomohiro, Nukaga, Osamu, Ueki, Shinji, Sugiyama, Masakazu, Inamoto, Yoshimasa, Ohtake, Hiroto, Samukawa, Seiji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Année:

2010

Langue:

english

Fichier:

PDF, 466 KB

english, 2010

24

[American Vacuum Soc 1999 4th International Symposium on Plasma Process-Induced Damage - Monterey, CA, USA (9-11 May 1999)] 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - Pulse-time-modulated plasma etching for high performance polysilicon patterning on thin gate oxides

Ohtake, H., Samukawa, S., Noguchi, K., Iida, H., Sato, A., Xue-yu Qian,

Année:

1999

Langue:

english

Fichier:

PDF, 187 KB

english, 1999

25

Essential points for precise etching processes in pulse-time-modulated ultrahigh-frequency plasma

Année:

1997

Langue:

english

Fichier:

PDF, 484 KB

english, 1997

26

Effect of supplied substrate bias frequency in ultrahigh-frequency plasma discharge for precise etching processes

Samukawa, Seiji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Année:

1996

Langue:

english

Fichier:

PDF, 535 KB

english, 1996

27

[IEEE 1994 VLSI Technology Symposium - Honolulu, HI, USA (7-9 June 1994)] Proceedings of 1994 VLSI Technology Symposium - Pulse-time modulated ECR plasma etching for highly selective, highly anisotropic and less-charging poly-Si gate patterning

Samukawa, S., Terada, K.

Année:

1994

Langue:

english

Fichier:

PDF, 201 KB

english, 1994

28

[IEEE 2010 IEEE International Symposium on Circuits and Systems - ISCAS 2010 - Paris, France (2010.05.30-2010.06.2)] Proceedings of 2010 IEEE International Symposium on Circuits and Systems - A 2-dimensional Si nanodisk array structure for spiking neuron models

Morie, Takashi, Sun, Yilai, Liang, Haichao, Igarashi, Makoto, Huang, Chi-Hsien, Samukawa, Seiji

Année:

2010

Langue:

english

Fichier:

PDF, 453 KB

english, 2010

29

Highly selective silicon nitride etching to Si and SiO 2 for a gate sidewall spacer using a CF 3 I/O 2 /H 2 neutral beam

Nakayama, Daiki, Wada, Akira, Kubota, Tomohiro, Bruce, Robert, Martin, Ryan M, Haass, Moritz, Fuller, Nicholas, Samukawa, Seiji

Journal:

Journal of Physics D Applied Physics

Année:

2013

Langue:

english

Fichier:

PDF, 1.30 MB

english, 2013

30

Chemical Reaction Dynamics of SiO 2 Etching by CF 2 Radicals: Tight-Binding Quantum Chemical Molecular Dynamics Simulations

Ito, Hiroshi, Kuwahara, Takuya, Higuchi, Yuji, Ozawa, Nobuki, Samukawa, Seiji, Kubo, Momoji

Journal:

Japanese Journal of Applied Physics

Année:

2013

Langue:

english

Fichier:

PDF, 1.61 MB

english, 2013

31

Damage mechanism in low-dielectric (low-k) films during plasma processes

B. Jinnai, T. Nozawa, S. Samukawa

Année:

2008

Langue:

english

Fichier:

PDF, 1.21 MB

english, 2008

32

Irradiation-Damages in Atmospheric Plasma Used in a Resist Ashing Process for Thin Film Transistors

Sato, Taiki, Ueno, Akira, Yara, Takuya, Miyamoto, Eiji, Uraoka, Yukiharu, Kubota, Tomohiro, Samukawa, Seiji

Journal:

Japanese Journal of Applied Physics

Année:

2009

Langue:

english

Fichier:

PDF, 234 KB

english, 2009

33

[IEEE 2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO) - Sendai, Japan (2016.8.22-2016.8.25)] 2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO) - Transient photoluminescence in InGaN nano-disks fabricated by nano-scale neutral-beam etching utilizing bio-nano templates

Chen, Yafeng, Chen, Shula, Kiba, Takayuki, Lee, Chang Yong, Thomas, Cedric, Lai, Yi-Chun, Higo, Akio, Samukawa, Seiji, Murayama, Akihiro

Année:

2016

Langue:

english

Fichier:

PDF, 246 KB

english, 2016

34

Induction of apoptosis by Galectin-9 in liver metastatic cancer cells: In vitro study

Tadokoro, Tomoko, Fujihara, Shintaro, Chiyo, Taiga, Oura, Kyoko, Samukawa, Eri, Yamana, Yoshimi, Fujita, Koji, Mimura, Shima, Sakamoto, Teppei, Nomura, Takako, Tani, Joji, Yoneyama, Hirohito, Morishit

Journal:

International Journal of Oncology

Année:

2017

Langue:

english

Fichier:

PDF, 730 KB

english, 2017

35

Quadriceps force and anterior tibial force occur obviously later than vertical ground reaction force: a simulation study

Ueno, Ryo, Ishida, Tomoya, Yamanaka, Masanori, Taniguchi, Shohei, Ikuta, Ryohei, Samukawa, Mina, Saito, Hiroshi, Tohyama, Harukazu

Journal:

BMC Musculoskeletal Disorders

Année:

2017

Langue:

english

Fichier:

PDF, 1.15 MB

english, 2017

36

Oral Administration of Red Ginseng Extract Promotes Neurorestoration after Compressive Spinal Cord Injury in Rats

Zhu, Pengxiang, Samukawa, Keiichi, Fujita, Hiroko, Kato, Hidemasa, Sakanaka, Masahiro

Journal:

Evidence-based Complementary and Alternative Medicine

Année:

2017

Langue:

english

Fichier:

PDF, 5.45 MB

english, 2017

37

The effects of a subsequent jump on the knee abduction angle during the early landing phase

Ishida, Tomoya, Koshino, Yuta, Yamanaka, Masanori, Ueno, Ryo, Taniguchi, Shohei, Samukawa, Mina, Saito, Hiroshi, Matsumoto, Hisashi, Aoki, Yoshimitsu, Tohyama, Harukazu

Journal:

BMC Musculoskeletal Disorders

Année:

2018

Langue:

english

Fichier:

PDF, 1.03 MB

english, 2018

38

Pulse-Time-Modulated Plasma and its Applications for Plasma Etching

Samukawa, Seiji, Mieno, Tetsu

Journal:

IEEJ Transactions on Fundamentals and Materials

Année:

1998

Fichier:

PDF, 1.91 MB

1998

39

Diagnosis and treatment of Pneumocystis jirovecii pneumonia in HIV-infected or non-HIV-infected patients—difficulties in diagnosis and adverse effects of trimethoprim-sulfamethoxazole

Kato, Hideaki, Samukawa, Sei, Takahashi, Hiroyuki, Nakajima, Hideaki

Journal:

Journal of Infection and Chemotherapy

Année:

2019

Langue:

english

Fichier:

PDF, 388 KB

english, 2019

40

Clinical effects of submucosal middle turbinectomy for eosinophilic chronic rhinosinusitis; 好酸球性副鼻腔炎に対する粘膜下中鼻甲介骨切除術の臨床効果;

Akiyama, Kosuke, Samukawa, Yasushi, Takahashi, Satoshi, Ouchi, Youhei, Hoshikawa, Hiroshi

Journal:

Nippon Jibiinkoka Gakkai Kaiho

Année:

2019

Fichier:

PDF, 1.77 MB

2019

41

Film-nanostructure-controlled inerasable-to-erasable switching transition in ZnO-based transparent memristor devices: sputtering pressure dependency

Simanjuntak, Firman Mangasa, Ohno, Takeo, Samukawa, Seiji

Journal:

ACS Applied Electronic Materials

Année:

2019

Langue:

english

Fichier:

PDF, 13.92 MB

english, 2019

42

[IEEE 2019 Compound Semiconductor Week (CSW) - Nara, Japan (2019.5.19-2019.5.23)] 2019 Compound Semiconductor Week (CSW) - High efficiency 100-nm-sized InGaN/GaN active region fabricated by neutral-beam-etching and GaN regrowth for directional micro-LED

Zhang, Kexiong, Takahashi, Tokio, Ohori, Daisuke, Cong, Guangwei, Endo, Kazuhiko, Kumagai, Naoto, Samukawa, Seiji, Shimizu, Mitsuaki, Wang, Xuelun

Année:

2019

Langue:

english

Fichier:

PDF, 605 KB

english, 2019

43

High-quality nanodisk of InGaN/GaN MQWs fabricated by neutral-beam-etching and GaN regrowth: Towards directional micro-LED in top-down structure

Zhang, Kexiong, Takahashi, Tokio, Ohori, Daisuke, Cong, Guangwei, Endo, Kazuhiko, Kumagai, Naoto, Samukawa, Seiji, Shimizu, Mitsuaki, Wang, Xuelun

Journal:

Semiconductor Science and Technology

Année:

2020

Langue:

english

Fichier:

PDF, 1.23 MB

english, 2020

44

Decreasing of the thermal conductivity of Si nanopillar/SiGe composite films investigated by using a piezoelectric photothermal spectroscopy

Harada, Tomoki, Aki, Tsubasa, Ohori, Daisuke, Samukawa, Seiji, Ikari, Tetsuo, Fukuyama, Atsuhiko

Journal:

Japanese Journal of Applied Physics

Année:

2020

Fichier:

PDF, 678 KB

2020

45

Fabrication and simulation of neutral-beam-etched silicon nanopillars

Chuang, Min-Hui, Ohori, Daisuke, Li, Yiming, Chou, Kuan-Ru, Samukawa, Seiji

Journal:

Année:

2020

Fichier:

PDF, 3.29 MB

2020

46

Risks of inappropriate secretion of antidiuretic hormone in multiple system atrophy

Makoto Samukawa, Makito Hirano, Hikaru Sakamoto, Mari Kitada, Susumu Kusunoki, Yusaku Nakamura

Journal:

Movement Disorders

Année:

2011

Langue:

english

Fichier:

PDF, 1.69 MB

english, 2011

47

Numerical approach to the explanation of the response time of the Severinghaus type electrode

T. Samukawa, K. Ohta, M. Onitsuka, Y. Ito, R. Motohashi

Journal:

Analytica Chimica Acta

Année:

1995

Langue:

english

Fichier:

PDF, 714 KB

english, 1995

48

Accurate nano-EB lithography for 40-nm gate MOSFETs

Y. Ochiai, S. Manako, S. Samukawa, K Takeuchi, T. Yamamoto

Journal:

Microelectronic Engineering

Année:

1996

Langue:

english

Fichier:

PDF, 1.61 MB

english, 1996

49

High-performance and damage-free neutral-beam etching processes using negative ions in pulse-time-modulated plasma

Journal:

Applied Surface Science

Année:

2007

Langue:

english

Fichier:

PDF, 1.38 MB

english, 2007

50

Preface

Toshiaki Makabe, Seiji Samukawa

Journal:

Applied Surface Science

Année:

2007

Langue:

english

Fichier:

PDF, 63 KB

english, 2007